常压化学气相沉积,APCVD英语短句,例句大全

常压化学气相沉积,APCVD
1)APCVD常压化学气相沉积
1.Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)
2.TiN films were coated on glass substrates by atmospheric pressure chemical vapor deposition(APCVD) under different growth conditions,including different substrate temperatures and a gaseous mixture of varying chemical concentrations.本研究以TiCl4和NH3为反应气体,N2为保护气氛,用常压化学气相沉积法(APCVD)在玻璃基板上沉积制备得到了一系列不同反应温度和原料浓度的TiN薄膜。
3.N-doped TiO_2 films were grown by atmospheric pressure chemical vapor deposition(APCVD) with TiCl_4 and NH_3 as precursors.用常压化学气相沉积(APCVD)法,以四氯化钛(TiCl4)、氧气(O2)和氨气(NH3)作为气相反应先驱体,成功制备了掺氮二氧化钛(TiO2)薄膜。

英文短句/例句

1.A Study on Atmospheric Pressure Chemical Vapor Deposition of TiN Film and Its Kinetics;TiN薄膜常压化学气相沉积及动力学研究
2.A Ti_5Si_3 THIN FILM AND ITS COATING GLASS DEPOSITED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION METHOD常压化学气相沉积法制备Ti_5Si_3薄膜及其镀膜玻璃
3.Preparation of TiO_2 Films by Atmospheric Pressure Chemical Vapor Deposition & Study of Doping Properties;常压化学气相沉积法二氧化钛薄膜的制备与掺杂性能研究
4.Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)
5.Preparation and Study of TiO_2 Films and Doped TiO_2 Films by Continuous-Fast Atmospheric Pressure Chemical Vapor Deposition;连续快速常压化学气相沉积法制备二氧化钛与掺杂二氧化钛薄膜及其性能的研究
6.The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
7.Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究
8.Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究
9.thermally activated chemical vapour deposition热活化化学气相沉积
10.plasma activated chemical vapour deposition等离子体化学气相沉积
11.epitaxial CVD growth外延化学气相沉积生长
12.Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
13.Fabrication of Silicon Inverse Opal Three-Dimensional Photonic Crystal Using Lpcvd/Template Techniques;低压化学气相沉积/模板技术制备硅反蛋白石三维光子晶体
14.The Study of Diamond Films and Its Composite Films Deposited by Bias Voltage HFCVD;偏压热丝化学气相沉积金刚石膜及其复合膜的研究
15.Synthesis of Carbon Nanotubes by Low Pressure Chemical Vapor Deposition and Their Applications碳纳米管的低压化学气相沉积法制备及其应用研究
16.Effect of Oxygen Partial Pressure on the Morphology of ZnO Nanostructure Prepared by Chemical Vapor Deposition氧分压对化学气相沉积法合成ZnO纳米结构形貌的影响
17.Fabrication of Germanium Inverse Opal Three-dimensional Photonic Crystal by LPCVD低压化学气相沉积技术制备锗反蛋白石三维光子晶体
18.Study of CVD Function coating on Molybdenum Substrate钼表面化学气相沉积功能涂层的研究

相关短句/例句

atmospheric pressure chemical vapor deposition常压化学气相沉积
1.Titanium nitride(TiN)films were prepared by the atmospheric pressure chemical vapor deposition process using titanium tetrachloride and ammonia as reactive gases.以TiCl4和NH3为原料,用常压化学气相沉积法在玻璃基板表面沉积得到了TiN薄膜。
2.TiO_2/SnO_2:F composite films were deposited by atmospheric pressure chemical vapor deposition with Ti(OC_3H_7)_4 as pre- cursors and SnO_2:F coated glass as substrates.以Ti(OC_3H_7)_4为先驱体,SnO_2:F镀膜玻璃为基板,采用常压化学气相沉积法制备了TiO_2/SnO_2:F复合薄膜。
3)APCVD常压化学气相沉积法
1.SiO2 functional coatings with TEOS as substrate and air as carrier gas were prepared on steel HP40(25Cr35Ni) by means of atmospheric pressure chemical vapor deposition(APCVD).以正硅酸乙酯为源物质,空气为载气,采用常压化学气相沉积法在HP40(25Cr35Ni)合金钢基体上制备了SiO2涂层;研究了沉积温度、源物质温度以及气体流量等工艺参数对沉积速率的影响,并通过XRD和SEM分析了涂层的物相组成及表面形貌。
2.High activity TiO_2 and its composite catalyst were prepared by Atmospheric PressureChemical Vapor Deposition (APCVD) in this paper.本文采用常压化学气相沉积法(Atmospheric Pressure Chemical Vapor Deposition，APCVD)制备了TiO_2纤维及其掺杂复合催化剂，通过各种现代分析手段对制得的催化剂进行了表征；并进行了光催化活性测定。
4)atmospheric pressure metalorganic chemical vapor deposition常压金属有机物化学气相沉积
5)atmospheric-presure metal-organic chemical vapor deposition常压金属化学气相沉积法
6)atmosphere plasma-enhanced chemical vapor deposition (APECVD)常压等离子体化学气相沉积(APECVD)