1)unbalanced coefficient of magnetron磁控管非平衡度
1.The SEM,surface roughness tester and XRD was used respectively to analyze the influence of unbalanced coefficient of magnetron on the growth of Cr film under the magnetron sputtering environment with direct current and single magnetron pattern.采用扫描电子显微镜、表面粗糙度测试仪及X射线衍射仪分析了直流、单靶磁控溅射条件下磁控管非平衡度对Cr镀层生长过程的影响。
2.SEM,surface roughness tester and XRD were used to analyze the influence of unbalanced coefficient of magnetron and closed-state of magnertic field on microstructure,surface roughness and preferred orientation of the Cr coatings.利用非平衡磁控溅射离子镀技术于不同磁控管非平衡度和磁场闭合状态下在单晶硅基体上制备出Cr镀层,采用扫描电子显微镜、X射线衍射仪分析了不同生长阶段Cr镀层的微观形貌、表面粗糙度和晶体择优生长趋势的变化。
2)unbalanced magnetron非平衡磁控
英文短句/例句
1.Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
2.Studies in the Technologies for the a-C:H Films Prepared by Middle Frequency Unbalanced Magnetron Sputtering;中频非平衡磁控溅射制备DLC膜的工艺研究
3.Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
4.Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering非平衡磁控溅射掺Cr类石墨镀层的结构分析
5.Microstructures and Properties of Silicon Nitride Films Grown by Unbalanced Magnetron Sputtering非平衡磁控溅射制备氮化硅薄膜及其性能研究
6.Influence of oxidation temperature on microstructure and properties of unbalanced magnetron sputtered TiN coatings热氧化温度对非平衡磁控溅射TiN镀层的影响
7.Bias Voltage and Mechanical Properties of CrN Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering封闭磁场非平衡磁控溅射偏压对CrN镀层摩擦学性能影响
8.Software Design of Real-time Monitoring System of Unbalanced Magnetron Sputtering Ion-plating Equipment in Closed Field;闭合场非平衡磁控溅射离子镀装备实时监控系统软件设计
9.Discharge Properties of Unbalanced Magnetron Sputtering System and Application of TiN_x Films Deposition;非平衡磁控溅射沉积系统放电特性和沉积TiN_x薄膜应用研究
10.MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
11.Fabrication of Diamond-like Carbon Films by Ion Enhanced Middle Frequency Unbalanced Magnetron Sputtering;离子辅助中频非平衡磁控溅射制备类金刚石薄膜
12.Research of Ti-N-C Films Deposited by Ion Beam Assistant MF Twin Target Unbalanced Magnetron Sputtering;离子束辅助中频非平衡磁控溅射制备Ti-N-C膜的研究
13.Studies on Discharge Characteristics and Applications of ICP Enhanced Unbalanced Magnetron Sputtering in Cusp-field Confined Magnetron;会切场约束ICP增强非平衡磁控溅射放电及应用研究
14.Study on Microstructure and Properties of CrAlN Coatings Deposited by Closed Field Unbalanced Megnetron Sputtering闭合场非平衡磁控溅射沉积的CrAlN薄膜组织结构和性能研究
15.Tribological Properties of Ti-DLC Film Deposited by Mid-frequency Dual-magnetron Sputtering中频非平衡磁控溅射沉积Ti-DLC膜摩擦磨损性能研究
16.Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响
17.Study on Oxidation Resistant Behavior at High-temperature of TiN,TiAlN Coatings Prepared by Unbalanced Magnetron Sputtering非平衡磁控溅射离子镀TiN、TiAlN涂层抗高温氧化行为的研究
18.Effect of Target Current on Structure and Characteristics of the Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响
相关短句/例句
unbalanced magnetron非平衡磁控
3)unbalanced magnetron sputtering非平衡磁控溅射
1.Characteristics of titanium-doped diamond-like carbon films deposited by unbalanced magnetron sputtering;非平衡磁控溅射Ti掺杂类金刚石薄膜的基本特性
2.The research on half-analytical method in calculating the magnetic field of unbalanced magnetron sputtering;非平衡磁控溅射系统磁场的半解析法
3.Effect of Al content on properties of Ti_(1-x)Al_xN hard film prepared by unbalanced magnetron sputtering;Al含量对非平衡磁控溅射制备Ti_(1-x)Al_xN膜性能的影响
4)Magnetron/unbalanced磁控溅射/非平衡
5)magnetic field unbalance coefficient磁场非平衡度
6)unbalanced magnetron sputtering(UBMS)非平衡磁控溅射(UBMS)
延伸阅读
可控性与非可控性投入可控性与非可控性投入 可控性与非可控性投人可控性投入指学校和教育行政部门可以控制的教育资源投入。学校可以对教学负担、班级规模、课程教学单元的数量、每个教师承担的学科教学任务的平均量等可控性投入进行调节和平衡，以改进教学质量。教育行政部门可以对教师的专业准备程度、教学经验、培训要求、教师工资、设备供应、生活费用、图书馆藏书等投入进行选择，以调节教育的供给与需求。而非可控性投入指学校和教育行政部门不能控制的教育资源投入。如学生的种族、性别、年龄及家长的社会经济背景等无法控制的因素对教育有着不同程度的影响。教育部门不能控制学生家长的教育水平和收入状况，但应当推动教育机会平等的社会经济环境的实现。
