物理气相沉积,PVD英语短句,例句大全

物理气相沉积,PVD
1)PVD物理气相沉积
1.PVD (Ti,Al) N Coating and Its Tooling Quality;物理气相沉积(Ti,Al)N涂层刀具的切削性能
2.Progress in Research on Corrosion Resistance of PVD Hard Coating;物理气相沉积技术制备的硬质涂层耐腐蚀的研究进展
3.NEW PVD COATING & DIFFUSING TECHNIQUE;物理气相沉积镀渗新工艺

英文短句/例句

1.Electron Beam Vapor Deposited La_2Zr_2O_7 Thermal Barrier Coaings电子束物理气相沉积La_2Zr_2O_7热障涂层研究
2.Study on the Tribological Behaviors of Physical Vapor Deposition (PVD) Coatings;物理气相沉积（PVD）涂层的摩擦学行为研究
3.The Application and Development of Physical Vapor Deposition on Molds;物理气相沉积技术在模具中的应用及发展
4.Progress in EB-PVD Thermal Barrier Coatings电子束物理气相沉积热障涂层技术研究进展
5.Research and Prospect on Binding Force for PVD TiN Coating物理气相沉积TiN涂层结合力的研究现状与展望
6.Prospect and Current Status of Research on Physical Vapor-Deposited TiN Coating物理气相沉积TiN涂层的研究现状与展望
7.Apply PVD Process Instead of CVD to Deposit TIN Barrier Layer in Semiconductor Manufacture在半导体制造中使用物理气相沉积代替化学气相沉积来生长氮化钛阻挡层
8.A new technique was developed on the bases of PVD costing and PVD diffusing technique.在物理气相沉积镀层工艺基础上发展了镀渗新工艺。
9.The progress of Monte-Carlo simulation of the growth of thin films is reviewed.综述了蒙特卡罗方法模拟物理气相沉积薄膜生长的研究进展。
10.Studies on Preparation and Tribological Behaviors of Chromium Nitride Coatings;物理气相沉积氮化铬涂层的制备及其摩擦学性能研究
11.Microstructure and Property Research on TiAl-Based Alloy Sheet Fabricated by EB-PVD;电子束物理气相沉积制备TiAl基合金薄板的组织性能研究
12.Microstructure of As-Deposited Ni-Cr-Al Alloy Thin Sheet by EBPVD电子束物理气相沉积Ni-Cr-Al合金薄板微观组织研究
13.Application of Thermal-spraying and Electron Beam Physical Vapor Deposition Technologies on Preparation of Thermal Barrier Coatings热喷涂及电子束物理气相沉积技术在热障涂层制备中的应用
14.An approach called PVD is main way to prepare nano scale aluminium flake at present.本文阐述的物理气相沉积法(VD法)目前制备纳米片状铝粉的主要方法。
15.Modification of silk fabric via atmospheric pressure plasma liquid deposition丝织物的大气压等离子体液相沉积处理
16.plasma activated chemical vapour deposition等离子体化学气相沉积
17.thermally activated chemical vapour deposition热活化化学气相沉积
18.epitaxial CVD growth外延化学气相沉积生长

相关短句/例句

physical vapor deposition物理气相沉积
1.The physical vapor deposition always plays an important role in the surface treatment technology.物理气相沉积(PVD)在表面处理技术中占有举足轻重的地位。
2.Being seldom used in preparing the silicon coating,the technology of electronic beam physical vapor deposition(EB-PVD)is introduced as a emphases,and the principium and influential factors to per- formances of silicon coating are the main part of the paper.介绍了两大类硅膜的制备方法:物理方法与化学方法,其中包括物理方法中的电子束物理气相沉积技术(EB-PVD),目前该技术在国内应用比较少,所以对其工作原理、薄膜质量的影响因素等作了重点介绍。
3.The new research progress for physical vapor deposition in positive film material in recent years is summarized.综述了近年来国内外物理气相沉积在薄膜锂离子电池正极薄膜方面的研究新进展,着重介绍了射频磁控溅射、脉冲激光沉积、电子束沉积等制备技术的工作原理、特点及发展,并对这些制备技术在锂离子电池正极薄膜制备中的应用进行了分析、比较和评价。
3)physical vapour deposition物理气相沉积
1.In this paper,the principles,characteristics,application results and trends of development of physical vapour deposition are briefly described.扼要地介绍了物理气相沉积(PVD)的基本原理、特性、应用效果及发展趋势。
2.A new nonlinear optical material urea L_malic acid film (ULMA) was successfully prepared by physical vapour deposition (PVD) at appropriate heating temperature.通过控制加热温度,采用物理气相沉积(PVD)技术制备了新型有机非线性光学材料L-苹果酸脲(ULMA)的晶体薄膜,该薄膜保持了晶体良好的非线性光学性质。
4)physical vapor deposition物理气相沉积法
1.Employing the physical vapor deposition method,Bi2O3 powder was heated to 1050 ℃ at normal pressure in a horizontal tube furnace with the protection of argon gas and oxygen,and then cooled and deposited naturally.利用物理气相沉积法,在氩气和氧气保护下将氧化铋粉末在水平管式炉中常压加热至1050℃,然后降温沉积,在硅衬底上得到了大量具有规则矩形外形的二维纳米结构——片状氧化铋。
5)physical vapour deposition(PVD)物理气相沉积(PVD)
6)EB-PVD电子束物理气相沉积
1.The effect of high temperature rapid annealing on preparation of high silicon electrical steel by EB-PVD;高温快速退火对电子束物理气相沉积制备高硅硅钢片的影响
2.Oxidation Behavior at 1000℃ for Nanocrystalline Ni-20Cr-0.6Al Alloy Deposited by EB-PVD;电子束物理气相沉积制备纳米晶Ni-20Cr-0.6Al合金在1000℃的氧化行为
3.Research on Ultrathin High Temperature Structure Materials Achieved by EB-PVD;电子束物理气相沉积工艺制备超薄高温结构材料的研究