高功率脉冲磁控溅射,HPPMS英语短句,例句大全

高功率脉冲磁控溅射,HPPMS
1)HPPMS高功率脉冲磁控溅射
1.As a new technology providing high ionization rate of sputtering materials to deposit dense films with high performance,the high-power pulse magnetron sputtering(HPPMS) technology was\' comrehensively investigated in developed countries though it has seldom been reported in China.高功率脉冲磁控溅射技术(HPPMS)作为一种溅射粒子离化率高、可以沉积致密、高性能薄膜的新技术已经在国外广泛研究,但在国内尚未见研究报道。

英文短句/例句

1.Development of high-power pulse magnetron sputtering technology高功率脉冲磁控溅射技术的发展与研究
2.Breakdown Phenomena of Semiconductor Devices under the Impact of Hemp;高功率电磁脉冲辐射下半导体器件的击穿效应
3.The Microstructure and Properties of MgZrO Composite Protective Layer Deposited by Pulsed Magnetron Sputtering;脉冲磁控溅射制备MgZrO复合介质膜的结构与性能
4.The Application of Pulse Magnetron Sputtering on Manufacturing Quartz Crystal Resonators;脉冲磁控溅射法制备石英晶体谐振器的研究
5.Study of deposition and properties of aluminum nitride thin films by mediate frequency pulsed magnetron sputtering中频脉冲磁控溅射沉积氮化铝薄膜及性能研究
6.High power electromagnetic transient pulse in-phase synthesis of the Optic-Controlled Array光控阵列高功率瞬态电磁脉冲同相合成技术
7.Influence of Deposition Power of the Diamond-like Carbon Films Prepared by Medium Frequency Reactive Deposition中频磁控溅射制备a-C∶H薄膜中沉积功率的影响
8.Simulation of Electromagnetic Pulse Waveform over Lossy Ground of Missile Launch Position in the High Power Electromagnetic Circumstance高功率电磁环境下导弹发射阵地近地面电磁脉冲波形仿真
9.Measurement and analysis of EMF around pulsed power supplies脉冲功率电源辐射电磁场测量与分析
10.Research on Preparation and Properties of SiN_x/SiN_xO_y Films by Direct Current Pulse Magnetron Sputtering;直流脉冲磁控溅射法制备SiN_x/SiN_xO_y薄膜及其性能研究
11.High power electromagnetic pulse propagation in ionosphere高功率电磁波脉冲在电离层中的传播
12.Preparation of YBiO_3 Buffer Layers and YBCO Superconducting Thin Films by Magnetron Sputtering磁控溅射制备YBiO_3缓冲层和YBCO超导薄膜
13.Deposition Coated Conductor Buffer Layers Films by Magnetron Sputter Method磁控溅射法制备涂层导体缓冲层薄膜
14.A Preliminary Study of Ultrua-Wide band High Power Pulse Source超宽带高功率脉冲辐射源的初步研究
15.Research on the Novel Generating and Transmiting Techniques of High Power Electromagenatic Impulse新型大功率电磁脉冲形成与发射技术研究
16.Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System中频磁控溅射制备类金刚石薄膜的功率因素研究
17.Effects of Post-Deposition Annealing on ZrW_2O_8 Thin Films by Radio Frequency Magnetron Sputtering射频磁控溅射ZrW_2O_8薄膜的高温退火研究
18.A NEW SCHEME FOR DESIGNING A 8mm HIGH POWER PULSE COAXIAL MAGNETRON设计八毫米大功率脉冲同轴磁控管的新方案

相关短句/例句

Pulse magnetron sputtering脉冲磁控溅射
1.The titania film deposited on cenosphere particles by pulse magnetron sputtering deposition was studied.采用脉冲磁控溅射方法,开展了在空心微珠表面镀二氧化钛薄膜的研究。
3)magnetron sputtering power磁控溅射功率
4)direct current pulse magnetron sputtering(DC-PMS)直流脉冲磁控溅射(DC-PMS)
5)mid-frequency pulsed magnetron sputtering中频脉冲磁控溅射
1.Using a 2% Al-doped Zn target,ZnO∶Al(ZAO)thin films were deposited on a glass substrate by mid-frequency pulsed magnetron sputtering.利用中频脉冲磁控溅射方法,以掺杂质量2%Al的Zn(纯度99。
2.Using a Zn target with 2wt% Al, ZnO:Al(ZAO)thin films which were used on silicon thin film solar cells were deposited on glass substrate by mid-frequency pulsed magnetron sputtering.本文利用中频脉冲磁控溅射技术,以掺杂Al 2wt%的Zn:Al合金靶为靶材,研究了用于硅薄膜太阳电池的ZnO:Al(ZAO)透明导电薄膜,主要完成了以下几方面的工作:1、本实验使用的是美国AE公司的中频脉冲电源,采用中频脉冲磁控溅射的方法,首先在玻璃衬底上制备平面透明导电薄膜。
3.Using a Zn target with 2wt% Al, ZnO:A(lZAO)thin films which were used on silicon thin film solar cells were deposited on glass substrate by mid-frequency pulsed magnetron sputtering.本文利用中频脉冲磁控溅射方法,以掺杂Al 2wt%的Zn:Al合金靶为靶材,制备了用于硅薄膜太阳电池的绒面ZAO透明导电薄膜。
6)direct current pulse magnetron sputtering直流脉冲磁控溅射
1.Mo films were prepared on the Soda-lime glass(SLG) substrates by direct current pulse magnetron sputtering(DC-PMS).利用直流脉冲磁控溅射方法在玻璃衬底上制备太阳电池背接触Mo薄膜。